Spacer Engineered FinFET Architectures
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- 2017 Taylor
- Book Quality:
- CRC Press
- Date of Addition:
- Nonfiction, Technology,
- Usage Restrictions:
- This is a copyrighted book.
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