Spacer Engineered FinFET Architectures
Synopsis
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- Copyright:
- 2017 Taylor
Book Details
- Book Quality:
- ISBN-13:
- 9781351751032
- Publisher:
- CRC Press
- Date of Addition:
- 2020-04-28T11:44:54Z
- Language:
- English
- Categories:
- Usage Restrictions:
- This is a copyrighted book.